top-notch lithography techniques
The nano.lab employs various e-beam and ion-beam lithography techniques.
E-beam and ion-beam lithography
with Elphy Plus featuring:
- patterning by electrons and ions
- FIB/SEM external beam control
- 2 ns writing speed resolution
- proximity effect correction
Raith eLINE Plus
(to be delivered in 01/2025)
Ultra high resolution electron beam-lithography, imaging and nanoengeneering
- high resolution electon optical column thechnology
- laser interferometric controlled sample stage with 100 mm travel distance
- 20 MHz DSP pattern generator
- proximity correction
- innovative and unique stitch-error-free writing strategies (fixed beam/moving stage and moving beam/moving stage)
- height correction
- gas injection modul