UV lithography with mask aligner

mask aligner; Copyright: Gillian kiliani

UV lithography is performed using a Karl Süss MJB 4 mask aligner. The MJB 4 is equipped with a 350W high-pressure mercury-vapor lamp, facilitating exposure at 365 nm and 405 nm.

Largest applicable masks are 5" × 5" resulting in sample sizes of at most 4" × 4". The uniformity of illumination over the 4" area is ±2%.

An XYΘ-table enables horizontal displacements and rotation with micrometer screws. The optical alignment is handled from top side. The MJB 4 offers vacuum as well as hard and soft contact mode.

Reference: Karl Süss KG, KSM-MJB 3 Anleitung 401, 1982.

short overview of optical lithography (german)

Credit: This video was produced by the "Medienlabor AG Medienwissenschaft/camera and cut: Lukas Burg" in the course of a web documentary for the 50 year anniversary of the University of Konstanz.